Reactive ion etching of lead zirconate titanate and ruthenium ox

Details Reactive ion etching of lead zirconate titanate and ruthenium ox Reactive ion etching of lead zirconate titanate and ruthenium ox

1993-07-22

1995-01-17

Breneman, R. Bruce

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156664, 156643, 156646, H01L 2100

Patent

active

053823206

ABSTRACT:
A method of reactive ion etching both a lead zirconate titanate ferroelectric dielectric and a RuO.sub.2 electrode, and a semiconductor device produced in accordance with such process. The dielectric and electrode are etched in an etching gas of O.sub.2 mixed with either CHCl.sub.2 CF.sub.3 or CHClFCF.sub.3.

REFERENCES:
patent: 4963701 (1989-01-01), Takoahi et al.
patent: 5109357 (1992-04-01), Eaton
patent: 5185689 (1993-02-01), Maniar
patent: 5254217 (1993-10-01), Maniar et al.

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