Reactive ion etching of lead zirconate titanate and ruthenium ox

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156664, 156643, 156646, H01L 2100

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active

053823206

ABSTRACT:
A method of reactive ion etching both a lead zirconate titanate ferroelectric dielectric and a RuO.sub.2 electrode, and a semiconductor device produced in accordance with such process. The dielectric and electrode are etched in an etching gas of O.sub.2 mixed with either CHCl.sub.2 CF.sub.3 or CHClFCF.sub.3.

REFERENCES:
patent: 4963701 (1989-01-01), Takoahi et al.
patent: 5109357 (1992-04-01), Eaton
patent: 5185689 (1993-02-01), Maniar
patent: 5254217 (1993-10-01), Maniar et al.

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