Electricity: measuring and testing – Impedance – admittance or other quantities representative of... – Lumped type parameters
Patent
1993-03-29
1995-01-17
Strecker, Gerard R.
Electricity: measuring and testing
Impedance, admittance or other quantities representative of...
Lumped type parameters
324661, 324684, 36457107, G01R 2726
Patent
active
053829115
ABSTRACT:
A non-intrusive means and method are disclosed for monitoring the interelectrode gap in a reaction chamber containing a pair of variably spaced, nominally parallel reaction-sustaining electrodes. An example is given in which the chamber is a plasma enhanced chemical vapor deposition chamber. The electrodes are treated as a parallel plate capacitor in order to measure the gap therebetween as well as the parallelism of the electrodes without requiring that the chamber be opened. A calibration curve is prepared by ascertaining known values of gaps by use of spacer gauges and then measuring and storing the corresponding values of the gaps and the capacitances. Once the calibration curve is established and stored, the spacing between the electrodes can be checked from time to time, as needed, without opening the chamber. It is only necessary to measure the capacitance existing and then refer the measured value to the stored values to read out the corresponding gap value. By making several capacitance measurements, a new curve can be made from time to time which can be compared as to slope with the stored calibration curve to check the parallelism of the electrodes.
REFERENCES:
patent: 3031617 (1962-04-01), Paquette
patent: 3736647 (1973-06-01), Roeder et al.
patent: 4067225 (1978-01-01), Dorman et al.
patent: 4461239 (1984-07-01), Cannella et al.
patent: 4555661 (1985-11-01), Benson et al.
patent: 4804905 (1989-02-01), Ding et al.
patent: 4855667 (1989-08-01), Hendrick et al.
patent: 4931887 (1990-06-01), Hegde et al.
Cotler Tina J.
Forster John C.
Kropp Lawrence A.
Singh Jyothi
Balconi-Lamica Michael J.
Do Diep
International Business Machines - Corporation
Strecker Gerard R.
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