Raster frame beam system for electron beam lithography

Details Raster frame beam system for electron beam lithography Raster frame beam system for electron beam lithography

2006-07-17

2010-11-30

Kim, Robert (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492100, C250S492200, C250S492210, C250S492230, C250S492300

Reexamination Certificate

active

07842935

ABSTRACT:
A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned in a raster pattern over the substrate, while shaping the electron beam responsively to the respective frame image of each of the frames as the electron beam is scanned over the respective frame position, so that in each frame, the electron beam simultaneously writes a multiplicity of the pixels onto the substrate.

REFERENCES:
patent: 5103101 (1992-04-01), Berglund et al.
patent: 5504629 (1996-04-01), Lim
patent: 5635976 (1997-06-01), Thuren et al.
patent: 5691541 (1997-11-01), Ceglio et al.
patent: 6617587 (2003-09-01), Parker et al.

Affiliated with

Also associated with

Rating

Raster frame beam system for electron beam lithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Raster frame beam system for electron beam lithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Raster frame beam system for electron beam lithography will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4209319