Rapid thermal heating apparatus and method

Electric resistance heating devices – Heating devices – Radiant heater

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

219390, A21B 200, F27B 514

Patent

active

061224391

ABSTRACT:
A rapid thermal heating apparatus in which lamps are disposed in a plurality of light pipes arranged to illuminate and supply heat to a substrate. The light pipes are positioned so that the illumination patterns overlap. The energy supplied to the lamps is controlled to provide a predetermined heating pattern to the substrate. A liquid cooled window cooperates with the light pipes to transmit energy to a wafer disposed in an evacuated chamber.

REFERENCES:
patent: 2057776 (1936-10-01), Groven
patent: 2318533 (1943-05-01), Selvig
patent: 3623712 (1971-11-01), McNeilly et al.
patent: 3761678 (1973-09-01), Eckles
patent: 3836751 (1974-09-01), Anderson
patent: 3862397 (1975-01-01), Anderson et al.
patent: 3936686 (1976-02-01), Moore
patent: 4047496 (1977-09-01), McNeilly et al.
patent: 4081313 (1978-03-01), McNeilly et al.
patent: 4101759 (1978-07-01), Anthony et al.
patent: 4232360 (1980-11-01), Vakil et al.
patent: 4270260 (1981-06-01), Krueger
patent: 4357523 (1982-11-01), Bleckmann
patent: 4378956 (1983-04-01), Lester
patent: 4389970 (1983-06-01), Edgerton
patent: 4411619 (1983-10-01), Darnell et al.
patent: 4414465 (1983-11-01), Newton et al.
patent: 4448000 (1984-05-01), Manuccia et al.
patent: 4470369 (1984-09-01), Edgerton
patent: 4489234 (1984-12-01), Harnden, Jr. et al.
patent: 4501072 (1985-02-01), Jacobi, Jr. et al.
patent: 4510555 (1985-04-01), Mori
patent: 4558660 (1985-12-01), Nishizawa et al.
patent: 4581248 (1986-04-01), Roche
patent: 4640224 (1987-02-01), Bunch et al.
patent: 4649261 (1987-03-01), Sheets
patent: 4680447 (1987-07-01), Mahawili
patent: 4680451 (1987-07-01), Gat et al.
patent: 4694143 (1987-09-01), Nishimura et al.
patent: 4698486 (1987-10-01), Sheets
patent: 4761538 (1988-08-01), Chiva et al.
patent: 4789771 (1988-12-01), Robinson et al.
patent: 4796562 (1989-01-01), Brors et al.
patent: 4818327 (1989-04-01), Davis et al.
patent: 4820377 (1989-04-01), Davis et al.
patent: 4830700 (1989-05-01), Davis et al.
patent: 4832777 (1989-05-01), Davis et al.
patent: 4832779 (1989-05-01), Fisher et al.
patent: 4836138 (1989-06-01), Robinson et al.
patent: 4854263 (1989-08-01), Chang et al.
patent: 4859832 (1989-08-01), Uehara et al.
patent: 4886954 (1989-12-01), Yu et al.
patent: 4891499 (1990-01-01), Moslehi
patent: 4902139 (1990-02-01), Adiutori
patent: 4910387 (1990-03-01), McWilliams
patent: 4911103 (1990-03-01), Davis et al.
patent: 4919542 (1990-04-01), Nulman et al.
patent: 4924073 (1990-05-01), Chiba
patent: 4956538 (1990-09-01), Moslehi
patent: 4975561 (1990-12-01), Robinson et al.
patent: 5000113 (1991-03-01), Wang et al.
patent: 5155336 (1992-10-01), Gronet et al.
patent: 5156820 (1992-10-01), Wong et al.
patent: 5179677 (1993-01-01), Anderson
patent: 5301090 (1994-04-01), Hed
patent: 5317492 (1994-05-01), Gronet et al.
patent: 5326171 (1994-07-01), Thompson et al.
patent: 5442727 (1995-08-01), Fiory
patent: 5487127 (1996-01-01), Gronet et al.
patent: 5683173 (1997-11-01), Gronet
patent: 5689614 (1997-11-01), Gronet et al.
patent: 5714392 (1998-02-01), Dawson
Spectrum, Model 211, Operation and Maintenance Manual.
Akiyama et al., "Critical Radial Temperature Gradient Inducing Slip Dislocations in Silicon Epitaxy Using Daul Heating of the Two Surfaces of a Wafer," Japanese Journal of Applied Physics, vol. 25, No. 11, Nov. 1986, pp. 1619-1622.
Hodul et al., "Measurement of Dynamic Temperature Uniformity in Rapid Thermal Processing," Solid State Technology, May 1988, pp. 209-211.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Rapid thermal heating apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Rapid thermal heating apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Rapid thermal heating apparatus and method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1081786

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.