Radio frequency generating systems and methods for forming pulse

Details Radio frequency generating systems and methods for forming pulse Radio frequency generating systems and methods for forming pulse

1997-03-14

1999-01-12

Lee, Benny T.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31323131, 333 99PL, H05H 146

Patent

active

058595015

ABSTRACT:
A radio frequency (RF) generating system for forming pulse plasma utilizes a plasma reaction device comprises a function generator, an amplifier, and an input port. The function generator generates a signal of time-modulated RF power according to a modulation function having a waveform, wherein the waveform gradually ascends at a rising edge and gradually descends at a falling edge. The input port receives the signal from the function generator and transmits the signal to the amplifier. The amplifier amplifies the signal to a predetermined level and then transmits the amplified signal to the plasma reaction device. A method for forming pulse plasma comprises the steps of generating a time-modulated RF power signal according to a modulation function having a waveform, wherein the waveform is shaped to gradually ascend at a rising edge and to gradually descend at a falling edge, amplifying the time-modulated RF power signal to a predetermined level, and transmitting the amplified time-modulated RF power signal to a plasma reaction device. In an embodiment of the present invention, the waveform is a half sine waveform, though other suitable waveforms include a half cosine waveform and a Gaussian pulse signal.

REFERENCES:
patent: 4935661 (1990-06-01), Heinecke et al.
patent: 5273609 (1993-12-01), Moslehi
Greines, J.H. and Halperin A.; "RF Sputtering Technique"; IBM Technical Disclosure Bulletin; vol. 17, No. 7; Dec. 1974; pp. 2172-2173.

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