Radiation sensitive resin composition comprising copolymer of is

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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430192, 430910, 430921, G03C 173

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055567347

ABSTRACT:
A radiation sensitive resin composition which comprises (A) a copolymer represented by the following general formula and (B) a radiation sensitive acid generator and, if necessary, (C) an alkali-soluble resin: ##STR1## wherein R represents a hydrogen atom or a methyl group and m and n are integers representing the numbers of the respective recurring units and satisfying the relations 0.1.gtoreq.m/(m+n)<0.6 and 0.4<n/(m+n).ltoreq.0.9. Said radiation sensitive resin composition is excellent in resolution and pattern profile and also excellent in sensitivity and developability and is useful as a chemically amplified resist good in contrast and heat resistance.

REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 4696886 (1987-09-01), Hanabata et al.
patent: 4752552 (1988-06-01), Aoai
patent: 4816375 (1989-03-01), Aoai
patent: 4857435 (1989-08-01), Hopf et al.
patent: 5059513 (1991-10-01), Hopf et al.
patent: 5322650 (1994-06-01), Endo et al.
Database WPI, Derwent Publications, AN-93-177961, JP-5-107757, Apr. 30, 1993.

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