Radiation sensitive resin composition

Details Radiation sensitive resin composition Radiation sensitive resin composition

1994-04-19

1996-02-27

Chapman, Mark

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430281, G03C 1492

Patent

active

054947774

ABSTRACT:
A radiation sensitive resin composition which can be suitably used as a negative type resist having a high sensitivity, a high resolution, a high yield of residual film thickness and high thermal resistance, and which comprises (A) an alkali-soluble novolak resin, (B) a phenolic compound having a standard polystyrene-reduced weight average molecular weight of 10,000 or less such as polyvinylphenol, (C) a compound capable of cross-linking the component (A) and/or the component (B) in the presence of an acid, and (D) a radiation sensitive acid generator such as a triazine compound having a halomethyl group.

REFERENCES:
patent: 3954475 (1976-05-01), Bonham et al.
patent: 3987037 (1976-10-01), Bonham et al.
patent: 4189323 (1980-02-01), Buhr
patent: 5057397 (1991-10-01), Miyabe et al.
patent: 5258257 (1993-11-01), Sinta et al.
patent: 5322650 (1994-06-01), Endo et al.

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