Radiation-sensitive poly(amic acid) polymer composition

Details Radiation-sensitive poly(amic acid) polymer composition Radiation-sensitive poly(amic acid) polymer composition

1981-12-17

1984-05-29

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

20415914, 20415918, 430197, 430283, 430919, 430920, G03C 168

Patent

active

044515510

ABSTRACT:
A light- or radiation-sensitive polymer composition comprising (a) a poly(amic acid) having as a major component a repeating unit of the formula: ##STR1## (b) one or more light- or radiation-sensitive compounds having an amino group and an aromatic azide group or aromatic sulfonylazide group in one molecule, and if necessary (c) one or more photosensitizers and/or amine compounds having at least one unsaturated bonding, and/or (d) one or more compounds having at least two unsaturated bonding in one molecule, is highly sensitive to light and radiation and can give a precise relief pattern on a substrate. Further, a finally obtained polyimide film is excellent in heat resistance.

REFERENCES:
patent: 3179614 (1965-04-01), Edwards
patent: 3740305 (1973-06-01), Hoback et al.
patent: 3923522 (1975-12-01), Hata et al.
patent: 3984250 (1976-10-01), Halstead et al.
patent: 4242437 (1980-12-01), Rohloff

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