Radiation-sensitive mixture and the production of relief structu

Details Radiation-sensitive mixture and the production of relief structu Radiation-sensitive mixture and the production of relief structu

1996-10-22

1999-06-22

Dote, Janis L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

4302701, 430330, 430910, 430921, 522 31, G03F 738, G03F 740, G03F 7039

Patent

active

059142197

ABSTRACT:
Positive-working radiation-sensitive mixtures, essentially consisting of

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patent: 5320931 (1994-06-01), Umehara et al.
patent: 5525453 (1996-06-01), Przybilla et al.
patent: 5712078 (1998-01-01), Huang et al.
Patent & Trademark Office English-Language Translation of Japanese Patent 4-51243 (Pub. Feb. 1992).
CAS Registry RN 124-41-4.

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