Radiation-sensitive mixture

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

4302701, 430330, 430905, 522 31, G03F 730, G03F 7004

Patent

active

060513705

ABSTRACT:
A radiation-sensitive mixture suitable for producing relief structures consists essentially of

REFERENCES:
patent: 3779778 (1973-12-01), Smith et al.
patent: 3915706 (1975-10-01), Limburg et al.
patent: 4101323 (1978-07-01), Buhr et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4678737 (1987-07-01), Schneller et al.
patent: 4684671 (1987-08-01), Tsuchiya et al.
patent: 4689288 (1987-08-01), Buiguez et al.
patent: 4770977 (1988-09-01), Buiguez et al.
patent: 4883740 (1989-11-01), Schwalm et al.
patent: 5034305 (1991-07-01), Nguyen-Kim et al.
patent: 5035979 (1991-07-01), Nguyen-Kim et al.
patent: 5069997 (1991-12-01), Schwalm et al.
Patent & Trademark English-Language Translation of Japanese Patent 2-62544 (pub. Mar. 2, 1990).
Patent & Trademark Office English-Language Translation of Japanese Patent 2-248952 (Pub. Oct. 4, 1990).
Patent Abstracts of Japan, vol. 12, No. 339 p. 757, Sep. 12, 1988 citing JP-63-97947.
Hayashi et al, Chem Abs. Photoresist, Issue 1, 1990 244016m.
PME, 1989, Polymers for Microelectronics--Science and Technology, p. 66-67.
Journal of Polymer Science, Part A, vol. 24, 2971-2980.
Crivello, Org. Coatings and Appl, Polym. Sci., 48 (1985), 65-69.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Radiation-sensitive mixture does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Radiation-sensitive mixture, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation-sensitive mixture will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2335214

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.