Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1997-04-18
1998-06-02
Dote, Janis L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
4302701, 430330, 430909, 430914, 430905, 430921, 522 31, 522 59, 522150, 522154, G03F 730, G03F 740, G03F 7004
Patent
active
057597502
ABSTRACT:
A radiation-sensitive mixture essentially consisting of
REFERENCES:
patent: 3779778 (1973-12-01), Smith et al.
patent: 3915706 (1975-10-01), Limburg et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4678737 (1987-07-01), Schneller et al.
patent: 4810613 (1989-03-01), Osuch et al.
patent: 4883740 (1989-11-01), Schwalm et al.
patent: 4904563 (1990-02-01), Aoai et al.
patent: 5069997 (1991-12-01), Schwalm et al.
patent: 5110709 (1992-05-01), Aoai et al.
patent: 5118582 (1992-06-01), Ueno et al.
patent: 5468589 (1995-11-01), Urano et al.
Crivello, "Applications of Photoinitiates Cationic Polymerization Toward the Development of New Photoresists", Org. Coatings & Appl. Polym. Sc., vol. 48, pp. 65-69, 1985.
Ito, "Solid-State Thermolysis of . . . ", J. Polym. Sci., Part A, Polym. Chem. Ed., vol. 24, pp. 2971-2980, 1986.
Schlegel et al., "Highly Sensitive Positive Deep UV . . . ", Microelectron. Eng., vol. 13, 1991, pp. 33-36.
Hesp et al., "Tetrahydropyranyl-and Furanyl-Protected . . . ", J. Appl. Polym. Sci., vol. 42, pp. 877-883 1991.
English Abstract for Japanese Patent 224-89-52A, (Oct. 4, 1990).
English Abstract for Japanese Patent 3083063A (Apr. 9, 1991).
English Abstract for Japanese Patent 2025-850 A (Jan. 29, 1990).
English Abstract for Japanese Patent 2161-436 A (Jun. 21, 1990).
Greene, Theodora W "Protective Groups in Organic Synthesis" John Wiley & Sons, NY (1981) pp. 10, 11, 22, 23, 87.
March, Jerry "Advanced Organic Chemistry" Fourth Edition John Wiley & Sons, NY (1992) pp. 763-764.
Binder Horst
Funhoff Dirk
Schwalm Reinhold
BASF - Aktiengesellschaft
Dote Janis L.
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