Radiation imaging process for forming pattern without alkali-sol

Details Radiation imaging process for forming pattern without alkali-sol Radiation imaging process for forming pattern without alkali-sol

1989-10-13

1991-01-15

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430141, 430145, 430160, 430162, 430176, 430311, 430312, G03F 7021, G02F 730

Patent

active

049853449

ABSTRACT:
A process for forming a pattern comprising forming an alkali-soluble polymer layer on a substrate, forming a radiation-sensitive composition layer containing a diazonium salt on the alkali-soluble polymer layer to form a resist layer having a two-layer structure, exposing the resist layer to a radiation to cause the change in solubility in an aqueous alkaline solution at the boundary between the two layers and forming a predetermined pattern in the resist layer by a usual resist process. The resist layer may comprise a plurality of layers comprising the two-layer structure as a repeating unit structure.

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