Radiation generating apparatus, radiation generating method,...

X-ray or gamma ray systems or devices – Specific application – Lithography

Reexamination Certificate

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C250S492200

Reexamination Certificate

active

06987830

ABSTRACT:
In a proximity X-ray exposure apparatus using a point source as a light source, a laser beam (21) is focused on a circular disk-like target (14) arranged in an X-ray source unit to irradiate it, thus generating a plasma and then X-rays (17). The circular disk-like target (14) has four types of quadrant first-, second-, third-, and fourth-wavelength light-emitting portions (14a, 14b, 14c, 14d) which are made of different materials and divided equiangularly in the radial direction. The target (14) is rotatably controlled by a rotational drive mechanism in synchronism with pulse emission. As the rotational angle of the target (14) is controlled in synchronism with emission of the laser beam (21), the material (type) of the target (14) can be selected from the first-, second-, third-, and fourth-wavelength light-emitting portions (14a, 14b, 14c, 14d).

REFERENCES:
patent: 5434900 (1995-07-01), Tanaka et al.
patent: 5835560 (1998-11-01), Amemiya et al.
patent: 6381005 (2002-04-01), Kasumi et al.
patent: 6560315 (2003-05-01), Price et al.
patent: 6735275 (2004-05-01), Itoga et al.
patent: 2003/0035508 (2003-02-01), Kasumi
patent: 0 628 806 (1994-12-01), None

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