Radial antenna and plasma processing apparatus comprising...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

Reexamination Certificate

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C118S7230MW

Reexamination Certificate

active

07807019

ABSTRACT:
Guide members (37) extending from the microwave entrance to a ring member (34) are arranged in the direction of propagation of microwave in a radial waveguide. The guide members (37) contribute to prevention of complex electromagnetic mode due to a microwave reflected from the peripheral portion of the radial waveguide. Therefore, a uniform plasma can be produced because the radiation into the process chamber is uniform even not by disposing any electromagnetic absorbing member at the peripheral portion of the radial waveguide. Since the microwave reflected from the peripheral portion of the radial waveguide can be used to produce a plasma if any electromagnetic absorbing member is not disposed, the plasma can be produced efficiently, and excessive heat is not generated.

REFERENCES:
patent: 5433789 (1995-07-01), Kakehi et al.
patent: 6470824 (2002-10-01), Kawakami et al.
patent: 2001/0008122 (2001-07-01), Goto et al.
patent: 0674334 1 (1995-09-01), None
patent: 63-293824 (1988-11-01), None
patent: 05-198388 (1993-08-01), None
patent: 7-263187 (1995-10-01), None
patent: 09-007998 (1997-01-01), None
patent: 11-045799 (1999-02-01), None
Mar. 2, 2006, Supplemental European Search Report.

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