Quartz guard ring centering features

Electric heating – Metal heating – By arc

Reexamination Certificate

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Details

C219S121400, C219S121440, C118S7230AN, C156S345340

Reexamination Certificate

active

08084705

ABSTRACT:
An electrode assembly and method of centering an outer ring around an electrode assembly in a plasma reaction chamber used in semiconductor substrate processing. The method includes positioning the outer ring around an outer surface of a backing member of the electrode assembly, and inserting at least one centering element between the outer ring and the backing member. The centering element can be a plurality of spring-loaded centering elements received in a cavity on the outer surface of the backing member, the centering elements having a first end adapted to contact the outer ring and a second end adapted to receive a spring. The outer ring surrounds an outer surface of the backing member, such that the plurality of spring-loaded centering elements are positioned between the outer surface of the backing member and an inner surface of the outer ring.

REFERENCES:
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patent: 6073577 (2000-06-01), Lilleland et al.
patent: 6824627 (2004-11-01), Dhindsa et al.
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patent: 6890861 (2005-05-01), Bosch
patent: 7244311 (2007-07-01), Fischer
patent: 7267741 (2007-09-01), Ren
patent: 7645341 (2010-01-01), Kennedy et al.
patent: 2008/0099120 (2008-05-01), Larson et al.
patent: 2005-19508 (2005-01-01), None
International Search Report and Written Opinion mailed Mar. 24, 2008 for PCT/US2007/021629.

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