PVD target

Details PVD target PVD target

2006-06-23

2010-10-19

McDonald, Rodney G (Department: 1795)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S298080, C204S298110, C204S298120, C204S298190, C204S298200

Reexamination Certificate

active

07815782

ABSTRACT:
A physical vapor deposition target assembly is configured to isolate a target-bonding layer from a processing region. In one embodiment, the target assembly comprises a backing plate, a target having a first surface and a second surface, and a bonding layer disposed between the backing plate and the second surface. The first surface of the target is in fluid contact with a processing region and the second surface of the target is oriented toward the backing plate. The target assembly may include multiple targets.

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