X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1990-05-09
1992-07-14
Westin, Edward P.
X-ray or gamma ray systems or devices
Specific application
Lithography
378119, 2504921, G21K 504
Patent
active
RE0339920
ABSTRACT:
A method and means for x-ray lithography which utilizes means for producing in a vacuum system a high-temperature plasma from which soft x-rays are emitted. The x-rays pass through a mask exposing an x-ray resist on a substrate to produce the desired pattern on the substrate. The x-ray spectrum has a significant energy in the 1-5 keV range. These x-rays pass through the support layer of the mask, stop in the pattern material (gold) of the mask or, where the pattern material is lacking, are absorbed adequately by the x-ray resist. Since there is very little energy above 5 keV, there is little if any substrate damage due to the x-rays.
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Henry I. Smith, Fabrication Techniques for Surface-Acoustic-Wave and Thin-Film Optical Devices; Proceedings of the IEE vol. 62, No. 10, Oct. 1974, pp. 1361 to 1387.
Nagel David J.
Peckerar Martin C.
McDonnell Thomas E.
Miles Edward F.
Porta David P.
The United States of America as represented by the Secretary of
Westin Edward P.
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