Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1996-05-08
1999-06-29
Wong, Don
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
315164, 315168, 315209R, H01J 724
Patent
active
059172860
ABSTRACT:
Various embodiments of a power supply are disclosed for generating plasmas. Current controlled power sources are disclosed that are capable of generating currents in low resistance, high temperature plasmas that are regulated to prevent the generation of excessive currents in the plasma. Current reversing switches are provided that control the flow of a direct current in a plasma chamber between various electrodes. A single current controlled power source capable of providing a substantially constant direct current can be utilized with various switch configurations to provide current that is delivered through three or more electrodes in a plasma chamber. Multiple power sources are also provided in association with shunt switches for delivering a plurality of sources of direct current in various directions between electrodes in a plasma chamber. In another embodiment of the present invention, inductive impedance can be provided in switch paths to cause a source of direct current to flow through a plasma chamber in various directions between electrodes. The use of multiple electrodes in association with a single voltage controlled power source is also disclosed.
REFERENCES:
patent: 3445782 (1969-05-01), Sonkin
patent: 4247383 (1981-01-01), Greve et al.
patent: 4383203 (1983-05-01), Stanley
patent: 4590436 (1986-05-01), Butler et al.
patent: 4590437 (1986-05-01), Butler et al.
patent: 4631493 (1986-12-01), Vendelin et al.
patent: 4695933 (1987-09-01), Nguyen et al.
patent: 4794506 (1988-12-01), Hino et al.
patent: 4950956 (1990-08-01), Asamaki et al.
patent: 4980810 (1990-12-01), McClanahan et al.
patent: 5118997 (1992-06-01), El-Hamamsy
patent: 5121084 (1992-06-01), Anderson et al.
patent: 5130003 (1992-07-01), Conrad
patent: 5178739 (1993-01-01), Barnes et al.
patent: 5192894 (1993-03-01), Teschner
patent: 5241152 (1993-08-01), Anderson et al.
patent: 5286360 (1994-02-01), Szczyrbowski et al.
patent: 5300205 (1994-04-01), Fritsche
patent: 5303139 (1994-04-01), Mark
patent: 5306986 (1994-04-01), Siao
patent: 5367448 (1994-11-01), Carroll
patent: 5417834 (1995-05-01), Latz
patent: 5460707 (1995-10-01), Wellerdieck
patent: 5616225 (1997-04-01), Sieck et al.
patent: 5718813 (1998-02-01), Drummond et al.
"Plasma Generators . . . RF & DC", ENI, A Division of Astec America, Inc., Rochester, N.Y., Nov. 14, 1995.
International Search Report, PCT/US97/07815, International Filing Date: Jun. 5, 1997, Priority Date: Aug. 6, 1996, Applicant: Advanced Energy Industries, Inc. et al. Aug. 22, 1997.
"Use Hybrid Junctions For More VHF Power," James A. Benjamin, Engineering Specialist ITT Semiconductors, West Palm Beach, Fla., Electronic Design 16, Aug. 1, 1968, pp. 54-59.
"Solid-State Amplifier Delivers Reliable Meteor-Burst Communication," by Joseph H. Johnson, Microwave Modules & Devices, Inc., Cover Feature.
"Planar Power Combining For Medium Power GaAs FET Amplifiers in X/KU-Bands," by Karl B. Niclas, Watkins-Johnson Company, Palo Alto, CA., Technical Feature/Microwave Journal (USA), vol. 22, No. 6.
Winkler, T., et al., "Dual Magnetron Sputtering for Glass Coating," International Conference on Metallurgical Coatings and Thin Films, Apr. 22-26, 1996, San Diego, CA.
MDX Astral.TM. 20 kW Bi-Polar Pulse Power Supply, Advanced Energy Brochure, 1996, Advanced Energy Industries, Inc., Fort Collins, CO.
Linz, T., "Pulse Power Products and Applications," Oct. 1995.
Sproul, W.D., et al., "Reactive Direct Current Magnetron Sputtering of Aluminum Oxide Coatings," Journal of Vacuum Science Technology 13(3) May/Jun. 1995, pp. 1188-1191.
Frach, P., et al., "Aspects and results of long-term stable deposition of Al.sub.2 O.sub.3 with high rate pulsed reactive megnetron sputtering," Surface and Coating Technology vol. 59, 1993, pp. 177-182.
Schiller, S., et al., "Pulsed Magnetron Sputter Technology," International Conference on Metallurgical Coatings and Thin Films, Apr. 19-23, 1993; San Diego, CA.
Williams, F.L., et al., "New method of arc suppression for reactive DC magnatron sputtering," (paper withdrawn before presentation) 1992 Optical Society of America Annual Meeting, Sep. 20-25, 1992, Albluquerque, New Mexico.
Beisswenger, S., et al., "Econimiccal Consideration sof Modern Web Sputtering Technology," Society of Vacuum Coaters, 35th Annual Techniccal Conference Proceedings (1992).
Christie David J.
Scholl Richard A.
Advanced Energy Industries Inc.
Philogene Haissa
Wong Don
LandOfFree
Pulsed direct current power supply configurations for generating does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Pulsed direct current power supply configurations for generating, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pulsed direct current power supply configurations for generating will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1378102