Projection lens for a microlithographic projection exposure...

Details Projection lens for a microlithographic projection exposure... Projection lens for a microlithographic projection exposure...

2007-05-22

2007-05-22

Lester, Evelyn A. (Department: 2873)

Optical: systems and elements

Lens

With field curvature shaping

C359S739000, C359S740000, C355S067000, C355S071000, C355S053000

Reexamination Certificate

active

11133531

ABSTRACT:
A projection lens for a EUV microlithographic projection exposure apparatus comprises a diaphragm (BL) which is arranged at a distance (D) in front of a mirror (S2) of the lens. The diaphragm (BL) has a non-round aperture with an edge contour that may be configured such two rays of a light bundle disposed symmetrically with respect to a chief ray are treated equally, i.e. either both rays pass through the diaphragm aperture or both are blocked by the diaphragm.

REFERENCES:
patent: 6445442 (2002-09-01), Von Bunau et al.
patent: 2004/0057134 (2004-03-01), Dinger
patent: 1093021 (2001-04-01), None
patent: 2774481 (1999-06-01), None
patent: 58125033 (1983-07-01), None

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