Projection lens for a microlithographic projection exposure...

Details Projection lens for a microlithographic projection exposure... Projection lens for a microlithographic projection exposure...

2006-06-27

2006-06-27

Sugarman, Scott J. (Department: 2873)

Optical: systems and elements

Lens

With field curvature shaping

C359S722000, C359S723000, C359S738000, C355S071000

Reexamination Certificate

active

07068436

ABSTRACT:
A projection lens (10) for a microlithographic projection exposure apparatus has a first optical element, for example a birefringent lens (L2), that has polarization dependent properties causing intensity fluctuations in an image plane of the projection lens. These fluctuation may be produced by a second optical element (24), for example a polarization selective beam splitting layer (28), that is arranged downstream of the first optical element. A gray filter (32; 132; 232) disposed in the beam path reduces the intensity fluctuations.

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