Projection electron beam apparatus and defect inspection...

Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S3960ML, C250S3960ML

Reexamination Certificate

active

08035082

ABSTRACT:
A sample is evaluated at a high throughput by reducing axial chromatic aberration and increasing the transmittance of secondary electrons. Electron beams emitted from an electron gun1are irradiated onto a sample7through a primary electro-optical system, and electrons consequently emitted from the sample are detected by a detector12through a secondary electro-optical system. A Wien filter8comprising a multi-pole lens for correcting axial chromatic aberration is disposed between a magnification lens10in the secondary electro-optical system and a beam separator5for separating a primary electron beam and a secondary electron beam, for correcting axial chromatic aberration caused by an objective lens14which comprises an electromagnetic lens having a magnetic gap defined on a sample side.

REFERENCES:
patent: 3472997 (1969-10-01), El-Kareh et al.
patent: 4779046 (1988-10-01), Rouberoi et al.
patent: 4962313 (1990-10-01), Rose
patent: 5084622 (1992-01-01), Rose
patent: 5763893 (1998-06-01), Nakasuji
patent: 5864142 (1999-01-01), Muraki et al.
patent: 6043491 (2000-03-01), Ose et al.
patent: 6111253 (2000-08-01), Tsuno
patent: 6191423 (2001-02-01), Krijn et al.
patent: 6310341 (2001-10-01), Todokoro et al.
patent: 6329659 (2001-12-01), Krijn et al.
patent: 6462474 (2002-10-01), Symons
patent: 6465797 (2002-10-01), Okunuki
patent: 6479819 (2002-11-01), Hamashima et al.
patent: 6509569 (2003-01-01), Frosien
patent: 6563114 (2003-05-01), Nagahama
patent: 6580073 (2003-06-01), Plies et al.
patent: 6608308 (2003-08-01), Takagi et al.
patent: 6635891 (2003-10-01), Nakano et al.
patent: 6661008 (2003-12-01), Takagi et al.
patent: 6770887 (2004-08-01), Krivanek et al.
patent: 6784437 (2004-08-01), Rose
patent: 6844548 (2005-01-01), Lopez et al.
patent: 6855929 (2005-02-01), Kimba et al.
patent: 6924488 (2005-08-01), Matsuya et al.
patent: 6992290 (2006-01-01), Watanabe et al.
patent: 7012262 (2006-03-01), Rose
patent: 7223973 (2007-05-01), Kimba et al.
patent: 7282727 (2007-10-01), Retsky
patent: 7321124 (2008-01-01), Rose
patent: 7351969 (2008-04-01), Watanabe et al.
patent: 7408175 (2008-08-01), Kimba et al.
patent: 7465939 (2008-12-01), Frosien
patent: 7569838 (2009-08-01), Watanabe et al.
patent: 2002/0024013 (2002-02-01), Gerlach et al.
patent: 2002/0148961 (2002-10-01), Nakasuji et al.
patent: 2003/0085353 (2003-05-01), Almogy et al.
patent: 2003/0098415 (2003-05-01), Matsuya et al.
patent: 2003/0122076 (2003-07-01), Matsuya et al.
patent: 2003/0189181 (2003-10-01), Ohta et al.
patent: 2003/0207475 (2003-11-01), Nakasuji et al.
patent: 2004/0108457 (2004-06-01), Kienzle et al.
patent: 2004/0159787 (2004-08-01), Nakasuji et al.
patent: 2004/0188635 (2004-09-01), Kawasaki et al.
patent: 2005/0253066 (2005-11-01), Watanabe et al.
patent: 2006/0169910 (2006-08-01), Frosien et al.
patent: 2007/0228922 (2007-10-01), Nakasuji
patent: 2008/0173814 (2008-07-01), Watanabe et al.
patent: 2008/0308729 (2008-12-01), Kimba et al.
patent: 2008/0315090 (2008-12-01), Nakasuji et al.
patent: 2009/0014649 (2009-01-01), Nakasuji et al.
patent: 2009/0212213 (2009-08-01), Nakasuji et al.
patent: 2009/0218506 (2009-09-01), Nakasuji et al.
patent: 62-31933 (1987-02-01), None
patent: 09-270241 (1997-10-01), None
patent: 11-067139 (1999-03-01), None
patent: 11-233062 (1999-08-01), None
patent: 11-238484 (1999-08-01), None
patent: 2000-228162 (2000-08-01), None
patent: 2001-148227 (2001-05-01), None
patent: 2001-513254 (2001-08-01), None
patent: 2001-291482 (2001-10-01), None
patent: 2002-367552 (2002-12-01), None
patent: 2003-157785 (2003-05-01), None
patent: 2003-173756 (2003-06-01), None
patent: 2003-187731 (2003-07-01), None
patent: 2003-234078 (2003-08-01), None
patent: 2004-87460 (2004-03-01), None
patent: 2004-165146 (2004-06-01), None
patent: 2004-214044 (2004-07-01), None
patent: 2004-214156 (2004-07-01), None
patent: 2004-235225 (2004-08-01), None
patent: 2004-303547 (2004-10-01), None
patent: 2004-335190 (2004-11-01), None
patent: 2004-342341 (2004-12-01), None
patent: 2005-197121 (2005-07-01), None
patent: 99-33085 (1999-07-01), None
patent: 02/37527 (2002-05-01), None
patent: 2005/024890 (2005-03-01), None
International Search Report of PCT/JP2006/305688 dated Jul. 4, 2006.
International Search Report of PCT/JP2006/314571, date of mailing Oct. 10, 2006.
Japanese Office Action dated Jul. 12, 2010, issued in corresponding Japanese Patent Application No. 2006-065143.
Japanese Office Action dated Dec. 10, 2010, issued in corresponding Japanese Patent Application No. 2006-065143.
International Search Report of PCT/JP2006/304088, date of mailing May 30, 2006.
Rose, H.; “Inhomogeneous Wien filter as a corrector compensating for the chromatic and spherical aberration of low-voltage electron microscopes.”; Optik, (1990), pp. 91-107, vol. 84, No. 3.
Tsuno, K.; “Negative aberrations generated by a Wien-type multi-pole corrector”; Japan Society for the Promotion of Science, Jul. 29, 2005, pp. 39-46.
Ioanoviciu, D. et al.; “Third order aberration theory of double Wien filters”; Review of Scientific Instruments, Nov. 2004, pp. 4434-4441, vol. 75, No. 11.
Tsuno K. et al.; “Third-order aberration theory of Wien filters for momchromators and aberration correctors”; Journal of Microscopy, Mar. 2005, pp. 205-215, vol. 217, Pt. 3.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Projection electron beam apparatus and defect inspection... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Projection electron beam apparatus and defect inspection..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection electron beam apparatus and defect inspection... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4275767

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.