Production of relief images or resist images by a negative-worki

Details Production of relief images or resist images by a negative-worki Production of relief images or resist images by a negative-worki

1983-08-22

1984-08-14

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430270, 430280, 430327, 430330, 430328, G03F 710, G03C 1495, G03C 171, G03C 516

Patent

active

044657609

ABSTRACT:
Relief images or resist images are produced by a negative-working process, using a photosensitive resist layer which is applied on a base and contains a compound possessing two or more aromatic and/or heteroaromatic o-nitrocarbinol ester groups as well as a crosslinking compound possessing two or more reactive groups which are capable, under the action of heat, of reacting with carboxyl groups to form a covalent chemical bond. To produce the relief images or resist images, the photosensitive resist layer is first exposed imagewise to actinic light, the exposed areas of this layer are subjected to selective thermal hardening and crosslinking and the resist layer is then post-exposed uniformly to actinic light and finally washed out with an aqueous developer.

REFERENCES:
patent: 3895952 (1975-07-01), Schlesinger
patent: 3926636 (1975-12-01), Barzynski et al.
patent: 3949143 (1976-04-01), Schlesinger
patent: 3996052 (1976-12-01), Schlesinger
patent: 4035189 (1977-07-01), Hayashi et al.
patent: 4400461 (1983-08-01), Chandross
Derwent Patent Reports: Derwent Publications Ltd., London, Great Britain, DT 2922-746, Derwent Access No. 90328, C/51, (BASF AG).

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