Production of negative relief copies

Details Production of negative relief copies Production of negative relief copies

1991-04-22

1995-01-10

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430165, 430190, 430191, 430192, 430193, 430302, 430328, 430330, G03F 7023, G03F 730

Patent

active

053806220

ABSTRACT:
Negative relief copies are produced by imagewise exposure of a recording plate consisting of a substrate and a photosensitive layer which is applied thereon and contains, as photosensitive compounds, esters of 1,2-naphthoquinone-2-diazide-4- and/or -5-sulfonic acid or -carboxylic acid, heating of the exposed plate, uniform exposure of the plate and development of the relief copy by dissolving the alkali-soluble components from the recording layer by means of an aqueous alkaline developer, by a process in which the photosensitive layer of the recording plate contains a reaction product of

REFERENCES:
patent: 4308368 (1981-12-01), Kubo et al.
patent: 4356254 (1982-10-01), Takahashi et al.
patent: 4504567 (1985-03-01), Yamamoto et al.
patent: 4576901 (1986-03-01), Stahlhofen et al.
patent: 4581321 (1986-04-01), Stahlhofen
patent: 4696891 (1987-09-01), Guzzi
patent: 4797346 (1989-01-01), Yamamoto et al.
patent: 4863829 (1989-09-01), Furuta et al.
patent: 4885232 (1989-12-01), Spak
patent: 4889788 (1989-12-01), Stahlhofen et al.
patent: 4927732 (1990-05-01), Merrem et al.
patent: 5110706 (1992-05-01), Yumoto et al.

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