Production of a resist image

Details Production of a resist image Production of a resist image

1985-06-28

1987-03-03

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430325, 430330, 430942, G03C 500

Patent

active

046475230

ABSTRACT:
A resist image is produced from a high-resolution, radiation-sensitive resist material by a process in which paraffin is applied as a resist material in a thin layer onto a substrate and irradiated in a predetermined pattern, for example by means of an electron beam, with crosslinking, and the non-irradiated, non-crosslinked parts of the resist layer are then removed. Particularly advantageously, the resist layer consisting of the paraffin is applied onto the substrate by vapor deposition and, after imagewise irradiation, the non-irradiated parts of the resist layer are removed by evaporation in order to develop the resist image.

REFERENCES:
patent: 3594170 (1971-07-01), Broyde
High Resolution Electron Microscopy, Giorgio et al, Journal of Polymer Science: Polymer Physics ed., vol. 22, 1931-1951 (1984).
Radiation Induced Phase Transition of Paraffins, Kawagushi et al, Inst. for Chem. Rev., Kyoto Univ., Kyoto Japan, vol. 59, No. 4, 284-92, Jul. 82.

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