Producing method of semiconductor device and substrate...

Details Producing method of semiconductor device and substrate... Producing method of semiconductor device and substrate...

2009-03-13

2011-12-27

Everhart, Caridad (Department: 2895)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

By reaction with substrate

C438S765000, C118S058000, C257SE21282, C257SE21285

Reexamination Certificate

active

08084369

ABSTRACT:
Disclosed is a producing method of a semiconductor device produced by transferring a plurality of substrates into a processing chamber, supplying oxygen-containing gas and hydrogen-containing gas into the processing chamber to process the plurality of substrates by oxidation, and transferring the plurality of the oxidation-processed substrates out from the processing chamber, wherein in the oxidation-processing, the hydrogen-containing gas is supplied from a plurality of locations of a region which is in proximity to the inner wall of the processing chamber and which corresponds to a substrate arrangement region in which the plurality of substrates are arranged in the processing chamber.

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