Producing method of semiconductor device and substrate...

Details Producing method of semiconductor device and substrate... Producing method of semiconductor device and substrate...

2011-01-18

2011-01-18

Everhart, Caridad M (Department: 2895)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

By reaction with substrate

C438S765000, C257SE21285, C257SE21552, C118S719000

Reexamination Certificate

active

07871938

ABSTRACT:
Disclosed is a producing method of a semiconductor device produced by transferring a plurality of substrates into a processing chamber, supplying oxygen-containing gas and hydrogen-containing gas into the processing chamber which is in a heated state to process the plurality of substrates by oxidation, and transferring the plurality of the oxidation-processed substrates out from the processing chamber, wherein the hydrogen-containing gas is supplied from a plurality of locations of a region corresponding to a substrate arrangement region in which the plurality of substrates are arranged in the processing chamber.

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