Processing method and apparatus

Details Processing method and apparatus Processing method and apparatus

1995-04-25

1998-10-20

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430313, 1566281, 1566431, 1566461, G03F 726

Patent

active

058244557

ABSTRACT:
A processing method comprises:

REFERENCES:
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patent: 4619894 (1986-10-01), Bozler
patent: 4810601 (1989-03-01), Allen
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patent: 5344522 (1994-09-01), Yagi et al.
patent: 5413664 (1995-05-01), Yagi et al.
R.A. Levy et al., "Characterization of LPCVD Aluminum for VLSI Processing" I. Electrochem. Soc., 131, 2175 (1984).
M. TaNeya et al., "Photo-oxidation of GaAs for in situ patterned-mask formation prior to chlorine gas etching", Applied Physics Letters, vol. 56, No. 1, pp. 98-100 (Jan. 1, 1990).

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