Coating processes – Coating by vapor – gas – or smoke – Base supplied constituent
Reexamination Certificate
2003-04-22
2009-11-10
Meeks, Timothy (Department: 1792)
Coating processes
Coating by vapor, gas, or smoke
Base supplied constituent
C427S255320, C427S255280, C427S255230, C427S248100
Reexamination Certificate
active
07615251
ABSTRACT:
A processing device, comprising a processing container, a shower head structure provided at the ceiling part of the processing container and having a plurality of gas jetting holes for jetting specified processing gas into the processing container formed in the gas jetting surface thereof facing the inside of the processing container, and a placing stand disposed in the processing container so as to face the shower head structure, wherein a head distance between the gas jetting surface and the placing stand and the blowing speed of gas from the gas jetting holes are set within the range surrounded by connecting, in a square shape with straight lines in a plane coordinate system having the head distance plotted on an abscissa and the gas jetting speed plotted on a coordinate, a point where the blowing speed of the gas from the gas jetting holes at the head distance of 15 mm is 32 m/sec, a point where the blowing speed of the gas from the gas jetting holes at the head distance of 15 mm is 67 m/sec, a point where the blowing speed of the gas from the gas jetting holes at the head distance of 77 mm is 40 m/sec, and a point where the blowing speed of the gas from the gas jetting holes at the head distance of 77 mm is 113 m/sec.
REFERENCES:
patent: 6113700 (2000-09-01), Choi
patent: 6126753 (2000-10-01), Shinriki et al.
patent: 6228173 (2001-05-01), Okase et al.
patent: 2002/0034857 (2002-03-01), Park et al.
patent: 9-017778 (1997-01-01), None
patent: 2001-185544 (2001-07-01), None
Kakimoto Akinobu
Matsudo Masahiko
Oshimo Kentaro
Gambetta Kelly M
Meeks Timothy
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Tokyo Electron Limited
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