Processing device and method of maintaining the device,...

Details Processing device and method of maintaining the device,... Processing device and method of maintaining the device,...

2005-05-31

2005-05-31

Lund, Jeffrie R. (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

Having glow discharge electrode gas energizing means

C156S345330, C156S345340, C156S345470, C118S715000, C118S7230ER, C118S733000

Reexamination Certificate

active

06899786

ABSTRACT:
A processing device in which maintenance can be easily carried out and a burden on a worker can be reduced, and a method of maintaining the device are provided. An upper electrode unit106structuring a ceiling portion of a processing chamber102of an etching device100is structured from a lower assembly128at a processing chamber102side including an upper electrode130, and an upper assembly126at a power supply side including an electro-body144. A lock mechanism156is released, and after the upper assembly126is independently raised and removed by a lift mechanism164, maintenance of the upper assembly126and/or the lower assembly128is carried out. The lock mechanism156is locked, and after the upper and lower assemblies126, 128are integrally raised and removed by the lift mechanism164, maintenance of an interior of the processing chamber102is carried out.

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PCT International Preliminary Examination Report, dated Feb. 27, 2003.

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