Processing apparatus and method

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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Details

118 501, 156345, B44C 122, C03C 1500, B05D 306, C23C 1400

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active

048865702

ABSTRACT:
A process module having remote plasma and in situ plasma generators, a source of ultraviolet, and a radiant heater, which represent four separate energy sources. The four sources can be used singly or in any combination and can be separately controllable.

REFERENCES:
patent: 3916822 (1975-11-01), Robinson
patent: 4615756 (1986-10-01), Tsujii et al.
patent: 4615905 (1986-10-01), Ovshinsky et al.
Lucovsky et al., "Deposition of Dielectric Films by Remote Plasma Enhanced CVD", Mat. Res. Soc. Symp. Proc., vol. 68, 1986, pp. 323-334.
Schmolla et al., "Amorphous BN Films Produced in a Double-Plasma Reactor for Semiconductor Applications", 205 Solid-State Electronics, vol. 26 (1983), Oct., No. 10, Exeter, Greate-Britain, pp. 931-939.

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