Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1993-06-17
2000-12-12
Chapman, Mark
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
4302701, 430326, 430919, 430921, G03C 1492
Patent
active
061596655
ABSTRACT:
Photoacid generators advantageous for use in applications such as photoacid generators used in chemically amplified resists are disclosed. These compounds are based on an ortho nitro benzyl configuration employing an .alpha. substituent having high bulk, steric characteristics, and electron withdrawing ability. The enhanced efficacy is particularly found in compounds both having a suitable .alpha. substituent and a second ortho substituent with large electron withdrawing and steric effects.
REFERENCES:
patent: 4996136 (1991-02-01), Houlihan et al.
patent: 5135838 (1992-08-01), Houlihan et al.
patent: 5200544 (1993-04-01), Houlihan et al.
Hansch & Leo "Substituent Constants for Correlation Analysis in Chemistry and Biology" p. 9-12 (1979).
Reichmanis et al. "Chemical Amplification Mechanisms for Microlithography" Chemistry of Materials (1991).
Steric Effects in Organic Chemistry, Melvin S. Newman, John Wiley & Sons, Inc., New York, p. 559 (1956).
Steric Effects in Drug Design, "The Upsilon Steric Parameter(enDefinition and Determination", M. Charton and I. Motoc, Eds., Springer-Verlag, New York, p. 57 (1983).
Physical Organic Chemistry, "Electrical Effect Substituent Constants for Correlation Analysis", R. W. Taft, Ed., Interscience Publication, John Wiley & Sons, New York, p. 119 (1981).
Proc. Polym. Mater. Sci. Eng., 66, 38 (1992).
"Elimination of Sulphinate from Sulphonic Esters", by Loudon, J. D. and Wellings, I., J. Chem. Soc., pp. 1780-1782 (1959).
Chin Evelyn
Houlihan Francis Michael
Nalamasu Omkaram
Chapman Mark
Lucent Technologies - Inc.
Rittman Scott J.
Schneider Bruce S.
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