Process of using absorptive layer in optical lithography with ov

Details Process of using absorptive layer in optical lithography with ov Process of using absorptive layer in optical lithography with ov

1985-06-24

1986-09-02

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430156, 430166, 430312, 430313, 430314, 430316, 430317, 430325, 430326, 430327, 430330, G03F 726, H01L 21308, H01L 21312

Patent

active

046096140

ABSTRACT:
A multilayer, photoresist recording medium is disclosed which comprises an absorptive layer and an oxygen plasma-resistant photoresist layer thereover. The structure is substantially free of intermixing of the two layers and separation of the photoresist layer during processing. The absorptive layer is formed by a two-step curing of a composition comprising a solution of a multifunctional acrylate or methacrylate monomer, a suitable dye and a photoinitiator in a suitable solvent. A coating of this composition is rapidly solidified to form an absorptive layer by high intensity irradiation and then baked to remove residual solvent and assure complete polymerization of the monomer.

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