Process of photoetching of superficial coatings based on polymer

Details Process of photoetching of superficial coatings based on polymer Process of photoetching of superficial coatings based on polymer

1987-06-29

1989-05-02

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430945, 430269, 430270, 430494, 21912167, 21912168, 522 2, 156643, G03C 516, B23K 900

Patent

active

048267554

ABSTRACT:
Process of photoetching of superficial coatings based on polymeric material comprising the irradiation of the coated surface with localized excimer laser beams having wavelengths equal to or lower than 193 nm.

REFERENCES:
patent: 4414059 (1983-11-01), Blum et al.
Chemical Abstracts, vol. 103, No. 4, Jul. 29, 1985, Columbus Ohio, USA, Garmonov, V.I. "Preparation and Study of Some Properties of Poly(p-xylxlene) Films", Abstract No. 23236r.

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