Process of making and using a positive working photosensitive fi

Details Process of making and using a positive working photosensitive fi Process of making and using a positive working photosensitive fi

1984-12-04

1986-03-18

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

1563082, 1563244, 430270, 430271, 430275, 430311, G03C 500

Patent

active

045769028

ABSTRACT:
A positive working photosensitive film resist material suitable for multiple image-wise exposure comprises, on a dimensionally stable base film, a photosensitive coating which contains (a) a polymer which possesses aromatic or hetero-aromatic o-nitrocarbinol ester groups (for example o-nitrobenzyl acrylate units) and which can be washed out, after exposure, with an alkaline solvent, and (b) a transparent plasticizer compatible with (a). The product may be used as photopolymer dry film resist material in the production of electrical conductor boards, chemically milled fine-line parts, and identification plates.

REFERENCES:
patent: 3849137 (1974-01-01), Barzynski et al.
patent: 4006013 (1977-02-01), McLaughlin et al.
patent: 4035139 (1977-07-01), Hayashi et al.

Affiliated with

Also associated with

Rating

Process of making and using a positive working photosensitive fi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process of making and using a positive working photosensitive fi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process of making and using a positive working photosensitive fi will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2305904