Process of doping silver image in chalcogenide layer

Details Process of doping silver image in chalcogenide layer Process of doping silver image in chalcogenide layer

1979-10-17

1981-05-26

Kimlin, Edward C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

156628, 1566591, 156662, 156663, 430314, 430317, 430324, 430328, 430330, 430296, 430272, 430432, 430523, 430564, G03C 500

Patent

active

042699355

ABSTRACT:
A layer of a chalcogenide glass resist material, on a substrate on which a microlithographic pattern is to be formed, has a deposit of silver halide on its outer surface. By actinic irradiation a latent silver image replicating the desired pattern is formed in the silver halide deposit. This image is developed to a metallic silver, which is used to photodope the resist material for subsequent etching to produce the microlithographic pattern on the substrate. Positive and negative patterns are possible from the same starting laminate. One form of a microlithographic pattern is a mask for producing electronic circuits.

REFERENCES:
patent: 3663224 (1972-05-01), Hallman et al.
patent: 3707372 (1972-12-01), Hallman et al.
patent: 3720515 (1973-03-01), Stanley
patent: 4127414 (1978-11-01), Yoshikawa et al.
patent: 4168168 (1979-09-01), Sato

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