Process of developing an image-wise exposed resist-coated substr

Details Process of developing an image-wise exposed resist-coated substr Process of developing an image-wise exposed resist-coated substr

1992-11-23

1993-08-10

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430165, 430191, 430192, 430193, 528155, 528160, G03F 732, G03F 7023

Patent

active

052347958

ABSTRACT:
A block copolymer novolak resin composition comprising at least one unit of the reaction product of an alkali-soluble phenolic polymer and a reactive ortho, ortho bonded oligomer having the formula: ##STR1## wherein x is from 2 to 7; wherein R is selected from hydrogen a lower alkyl group or lower alkoxy group having 1-4 carbon atoms and a halogen group; and Y.sub.1 is either a hydroxyl group; an alkoxy group or a halogen group; and Y.sub.2 is hydrogen, alkyl, alkoxy, halogen, hydroxyl, --CH.sub.2 OH, --CH.sub.2 -- halogen, or --CH.sub.2 --alkoxy group.

REFERENCES:
patent: 4377631 (1983-03-01), Toukhy et al.
patent: 4555469 (1985-11-01), Erdmann et al.
patent: 4642282 (1987-02-01), Stahlhofen
patent: 4731319 (1988-03-01), Kohera et al.
patent: 4826821 (1989-05-01), Clements
patent: 4835204 (1989-05-01), Carfagnini
patent: 4837121 (1989-06-01), Blakeney et al.
Non-Aqueous Titration of Polynuclear Phenolic Compounds: Part IV-Titration of Some High Molecular Weight Synthetic Compounds of Uniform Constitution by S. K. Chatterjee, Jun. 1969, pp. 605-610.
Correlation of Composition and DP of Some 3-Component Phenolic Block Copolymers with Their Titration Curves in Nonaqueous Media by S. K. Chatterjee et al., 1981, pp. 717-727.
Dissociation Behavior of Some Mixtures of Synthetic Phenolic Oligomers in Nonaqueous Media by S. K. Chatterjee et al., 1978, pp. 1031-1039.
Effect of Substituents on the Composition and Dissociation Behavior or Some Four Component Phenolic Copolymers by S. K. Chatterjee et al., Oct. 1981.
Study of Electrochemical Properties and Formation of Some Phenolic Block Copolymers by S. K. Chatterjee et al., 1983, pp. 93-103.

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