Process of developing a positive pattern in an O-quinone diazide

Details Process of developing a positive pattern in an O-quinone diazide Process of developing a positive pattern in an O-quinone diazide

1993-02-01

1993-10-26

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430165, 430326, 430942, G03F 730, G03F 7023

Patent

active

052565211

ABSTRACT:
A radiation-sensitive composition comprising an admixture in a solvent of: at least one alkali-soluble binder resin, at least one photoactive compound and an effective sensitivity enhancing amount of at least one tris (hydroxyphenyl) lower alkane compound; the amount of said binder resin being about 60% to 95% by weight, the amount of said photoactive component being about 5% to about 40% by weight, based on the total solids content of said radiation-sensitive composition.

REFERENCES:
patent: 3188210 (1965-06-01), Fritz et al.
patent: 3579542 (1971-05-01), Meyer et al.
patent: 4394496 (1983-07-01), Schrader
patent: 4738915 (1988-04-01), Komine et al.
patent: 4863828 (1989-09-01), Kawabe et al.
patent: 4871645 (1989-10-01), Uenishi et al.
Celanese Preliminary Information Bulletin for tris(p-hydroxyphenyl) ethane (no copyright date).

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