Process of deep ultra-violet imaging lithographic resist composi

Details Process of deep ultra-violet imaging lithographic resist composi Process of deep ultra-violet imaging lithographic resist composi

1988-03-18

1989-02-28

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430193, 430330, G03F 726

Patent

active

048085120

ABSTRACT:
Photosensitive solubilization inhibitor compounds of the formula ##STR1## wherein: x is an integer equal to the valence or functionality of the radical R, and

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patent: 4626491 (1986-12-01), Gray
Grant, B. et al., "Deep UV Photoresists I. Meldrum's Diazo Sensitizer", IEEE Transactions of Electron Devices, vol. ED-28, No. 11, Nov. 1981.
Schwall H., et al., "Thermolysis of 6-Membered 2-diazo-1,3 diketones in Pyridine and in Aniline", Index Chemicals, 34, 115474, (1969).
Best, W. M., et al., "Intromolecular Diels-Alder Additions of Benzynes to Furans", Current Abstracts of Chemistry, vol. 103, Issue 1189, 1986.
Korobitsyna, I. K., et al., Zhurnal Organicheskoi, Khimii, Jun., 1976, vol. 12, No. 6, pp. 1245-1260.

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