Process for using positive-working resist materials to form nega

Details Process for using positive-working resist materials to form nega Process for using positive-working resist materials to form nega

1981-11-25

1984-04-24

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430191, 430292, 430313, 430318, 430327, 430328, 430330, 430345, 430962, 430331, G03F 708, G03F 726

Patent

active

044448694

ABSTRACT:
An improved positive-working resist material capable of forming on a substrate either a positive resist pattern or a negative resist pattern. The positive-working resist material comprises a positive-working resist resin having incorporated therein one or more photochromic compounds, such as spiropyrans, triphenylmethane dyes, anils and the like. A positive or negative resist pattern having a remarkably improved definition can be obtained. The use of such a positive-working resist material in the formation of a negative resist pattern on the substrate is also disclosed.

REFERENCES:
patent: 3264104 (1966-08-01), Reichel
patent: 4007047 (1977-02-01), Kaplan et al.
patent: 4028111 (1977-06-01), Iwasaki et al.

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