Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1993-12-13
1996-10-29
Kunemund, Robert
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, 20419223, 20419226, C23C 1434, C23C 1458
Patent
active
055693628
ABSTRACT:
A treatment process for the purpose of improving the chemical and/or physical durability of film containing one or more metallic oxides, nitrides, oxynitrides or oxycarbides deposited on a transparent substrate by a cathodic sputtering technique, notably assisted by a magnetic field and preferably reactive in the presence of oxygen. Said process consists of subjecting the film to a low energy ion beam.
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Ion Implantation and Ion Beam Processing of Materials, Hublet et al., Materials Research Society Symposia Proceedings, vol. 27, pp. 765-770.
Lerbet Francois
Pillias Daniele
Kunemund Robert
McDonald Rodney G.
Saint-Gobain Vitrage International
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