Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1986-08-01
1987-09-29
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430302, 430309, 430328, 430330, 430331, G03F 708, G03F 726
Patent
active
046968911
ABSTRACT:
A process for the production of negative relief copies, wherein a photosensitive material comprising at least one o-quinone diazide and at least one quaternary ammonium compound is imagewise exposed, heated, and then uniformly exposed before developing, involves reduced heat-treatment temperatures and durations, and does not require the use of toxic amines.
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A. Ledwith, "Chemistry of Polymeric Resists Useful in Microlithography", Oct. 1983, IEE Proceedings, vol. 130, Pt. I, No. 5, pp. 245 through 251.
Bowers Jr. Charles L.
Hoechst Aktiengesellschaft
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