Process for the production of images after electrodeposition of

Details Process for the production of images after electrodeposition of Process for the production of images after electrodeposition of

1985-03-07

1986-12-30

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430165, 430168, 430190, 430192, 430193, 430270, 430275, 430278, 430286, 430318, 430326, 430327, G03F 736, H05K 306

Patent

active

046329005

ABSTRACT:
A positive photoresist is electrodeposited onto a substrate, exposed to actinic radiation in a predetermined pattern, and then exposed areas are removed by contact with a developer.
When the substrate is a metal-faced laminate, the exposed metal surface may be etched and the residual electrodeposited layer removed by contact with a suitable solvent, optionally after a second, general, exposure to actinic radiation.
Suitable electrodepositable positive photoresists include o-nitrocarbinol esters and o-nitrophenyl acetals, their polyesters and end-capped derivatives and quinone diazide sulphonyl esters of phenolic novolaks, having salt-forming groups in the molecule, especially carboxylic acid and amine groups.
The process is suitable for the production of printing plates and printed circuits, especially circuits on both sides of a liminate sheet linked conductively through metal-lined holes in the sheet.

REFERENCES:
patent: 3738835 (1973-06-01), Bakos
patent: 3849137 (1974-11-01), Barzynski et al.
patent: 3890152 (1975-06-01), Ruckert et al.
patent: 3991033 (1976-11-01), Sam
patent: 4080246 (1978-03-01), Battisti et al.
patent: 4086210 (1978-04-01), Petropoulos
patent: 4105518 (1978-08-01), McGinniss
patent: 4306010 (1981-12-01), Uehara et al.
patent: 4362853 (1982-12-01), Demmer
patent: 4414311 (1983-11-01), Walls et al.

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