Process for the preparation of partially protected phenolic resi

Details Process for the preparation of partially protected phenolic resi Process for the preparation of partially protected phenolic resi

1995-12-14

1997-09-02

Mosley, Terressa

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430 18, 525242, 525298, 525534, G03C 500

Patent

active

056630387

ABSTRACT:
A process for the preparation of phenolic resins having acid-labile acetal or ketal protecting groups by reacting a phenolic resin with an enol ether in the presence of an acidic catalyst and subsequently treating the reaction mixture with a basic anion exchanger gives heat-resistant polymers which, in combination with acid photogenerators, produce radiation-sensitive compositions of high processing stability with a greatly improved shelf life.

REFERENCES:
patent: 5356752 (1994-10-01), Cabrera et al.
European Search Report for European Patent Application EP 95 30 9071 dated Apr. 25, 1996.

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