Process for the formation of a negative resist pattern from a co

Details Process for the formation of a negative resist pattern from a co Process for the formation of a negative resist pattern from a co

1992-01-14

1994-02-15

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430165, 430191, 430192, 430193, 430328, 430330, G03F 732, G03F 738, G03F 7023

Patent

active

052866092

ABSTRACT:
A negative resist pattern is formed using a resist containing a diazoquinone sensitizer. An imagewise exposed area of a layer of the resist is subjected to heat treatment with a water-containing heating medium in the presence of a carboxyl-inactivating agent. The entire surface of the layer is exposed to radiation. The thus-exposed surface is then treated with an alkaline developer solution. An apparatus suitable for use in the practice of the above process is also disclosed.

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