Process for the development of relief structures based on radiat

Details Process for the development of relief structures based on radiat Process for the development of relief structures based on radiat

1983-12-15

1985-09-03

Kittle, John

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430283, 430287, 430331, 430330, G03C 170, G03C 516

Patent

active

045392889

ABSTRACT:
An improved development process for relief structures based on radiation-crosslinked polymeric precursors of polymers which are resistant to high temperature in which the development fluid used is an aliphatic or cycloaliphatic ketone having 3 to 7 carbon atoms, is distinguished by rapid and complete removal of soluble polymeric material from the substrate with, at the same time, a minimum amount of attack on the radiation-crosslinked polymeric structures.

REFERENCES:
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patent: 3376139 (1968-04-01), Giangualano et al.
patent: 3957512 (1976-05-01), Kleeberg et al.
patent: 4045223 (1977-08-01), Rubner et al.
patent: 4243743 (1981-01-01), Hiramoto et al.
patent: 4321319 (1982-03-01), Shoji et al.
patent: 4339521 (1982-07-01), Ahne et al.
Vaclav Sedivec and Jan Flek, Handbook of Analysis of Organic Solvents, (John Wiley & Sons, Inc., New York, N.Y., 1976) pp. 274-276.

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