Process for surface treatment

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156643, 156646, 204298, 427 35, H01L 21306

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active

048571377

ABSTRACT:
An ion beam is allowed to hit the surface of a target and the resulting forward scattered particle beam is then allowed to hit the surface of a workpiece, thereby etching or modifying the surface of the workpiece or depositing a film on the surface of the workpiece. By bombardment of ions with the target, electric charges possessed by the ion beam are lost, and only the thus neutralized forward scattered particle beam is allowed to hit the surface of the workpiece, and thus the said surface treatment can be carried out without any electrically charging trouble.

REFERENCES:
patent: 4343829 (1982-08-01), Tochikubo et al.
patent: 4540446 (1985-09-01), Nishizawa
patent: 4662977 (1987-05-01), Motley et al.
Boyd et al., "Directional Reactive Ion Etching at Oblique Angles" Appl. Phys. Lett. 36(7), Apr. 1, 1980.

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