Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2005-05-17
2005-05-17
Norton, Nadine G. (Department: 1765)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S725000, C430S323000, C430S325000, C216S016000, C216S067000
Reexamination Certificate
active
06893972
ABSTRACT:
The novel process lends itself to the production of highly resolved resist structures. A resist structure having webs is produced from a photoresist on a substrate and then the sidewalls of the webs are selectively chemically amplified so that chemically amplified sidewall structures are obtained. After the removal of the chemically unamplified sections, the amplified sidewall structures are transferred to the substrate. The process permits a resolution of structures that are not producible using the currently customary exposure wavelengths.
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Eschbaumer Christian
Falk Gertrud
Herbst Waltraud
Hohle Christoph
Kühn Eberhard
Greenberg Laurence A.
Mayback Gregory L.
Norton Nadine G.
Stemer Werner H.
Umez-Eronini Lynette T.
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