Process for producing storage-stable surfaces of polished silico

Details Process for producing storage-stable surfaces of polished silico Process for producing storage-stable surfaces of polished silico

1992-04-03

1993-06-15

Chaudhuri, Olik

Fishing, trapping, and vermin destroying

427301, 427387, 437238, H01L 21302, B05D 304

Patent

active

052196135

ABSTRACT:
Silicon wafers are first subjected to an oxidative treatment and subsequey to exposure to organosilicon compounds which contain at least one radical in the molecule which is hydrolyzably bound to the silicon and at least one radical in the molecule having hydrophilic properties. Depending on the compound selected, more or less strongly hydrophilic or hydrophobic properties of the silicon surface can consequently be established under mild conditions. The wafers treated in such a manner have a high storage stability and retain their surface nature even under difficult climatic circumstances. The surface nature present after the oxidative treatment can then be restored particularly easily by hydrolysis.

REFERENCES:
patent: 4724171 (1988-02-01), Lampert
patent: 4973563 (1990-11-01), Prigge et al.
patent: 5008127 (1991-04-01), Ogawa

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