Process for producing patterned resin films which includes pretr

Details Process for producing patterned resin films which includes pretr Process for producing patterned resin films which includes pretr

1994-07-05

1997-06-10

Lesmes, George F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430326, 430331, 134 1, 134 27, 134 28, 134902, G03C 500, B08B 312, B08B 300, B08B 600

Patent

active

056374437

ABSTRACT:
An uncomplicated and easy to control process for forming patterns, wherein an active beam sensitive resin is exposed to an active beam such that a correctly formed pattern is produced on the resin. The process comprises the steps of forming a film of an active beam sensitive resin on a substrate, exposing the film to an active beam, and developing the exposed film with a developing solution comprising a weakly basic salt in a basic aqueous solution having a hydrogen ion concentration sufficient to finish the developing within a desired period of time and an ionic strength sufficient to prevent a substantial decrease in the thickness of the exposed film.

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English Translation of JP-4-338960 Kurihara et al.
JP 63-229,452 English Translation, Hashimoto Mar. 1987.
IBM Tech. Disc. Bulletin, vol. 15, No. 11, Apr., 1973 Arcus et al.

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