Process for producing fine patterns

Details Process for producing fine patterns Process for producing fine patterns

1986-08-07

1988-02-02

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430197, 430317, 430325, G03F 726, G03C 500

Patent

active

047228830

ABSTRACT:
Fine patterns with high degree of resolution and high resistance to etching can be produced by coating a solution of a photosensitive composition comprising (a) an aromatic azide compound and (b) an alkaline-aqueous-solution-soluble polymer on a substrate, exposing predetermined portions of the coated photosensitive composition to ultraviolet light, developing with an alkaline aqueous solution to form a resist pattern, and etching the substrate using said resist pattern as a mask.

REFERENCES:
patent: 2848328 (1958-08-01), Hepher
patent: 3595656 (1971-07-01), Ruckert et al.
patent: 3869292 (1975-03-01), Peters
patent: 3887373 (1975-06-01), Hays et al.
patent: 4401745 (1983-08-01), Nakane et al.

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